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Equipment

shebeizhanshi

Sapphire 406

Overall dimension2.0*2.0*2.5m
Effective coating space590 * 400mm
Air extraction systemMolecular pump + mechanical pump
Power Supply

50KW,380V,50HZ,3PHASE

BiasHigh frequency pulse power supply
Number of target sources

4,Magnetron sputtering 1 ~ 3, ion source 1 ~ 3

Control systemProgrammable controller + computer
Coating process temperature80 ~ 180 degrees
Typical coatingSputtering tin titanium nitride, sputtering CrN chromium nitride, DLC diamond-like carbon, etc. single layer, composite, nano coating