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Titanium nitride (TiN) coating is the most common coating since the invention of PVD technology. It has high cost performance. It is also the most widely used PVD coating in the past years. It has high film hardness. Titanium nitride deposited by magnetron sputtering has slow deposition speed, small surface particles, so the surface is smooth, and there are few surface defects such as droplets, but the surface hardness is low. Titanium nitride deposited by magnetron cathode arc has fast deposition speed, but the surface particles are large, so the surface finish is poor and there are many surface defects such as droplets, but higher surface hardness can be obtained.

Customers need to decide which method to use to obtain titanium nitride (TIN) coating according to product characteristics and requirements. The coating machine of shengbeier super strong coating has two methods: enhanced magnetron sputtering and magnetron cathode arc, which can flexibly select different methods to obtain titanium nitride (TIN) coating according to the workpiece.