| Overall dimension | 2.5 * 2.3 * 3.0m | ||
| Effective coating space | 960 * 950mm | ||
| Air extraction system | Molecular pump + mechanical pump | ||
| Power Supply | 80KW,380V,50HZ,5PHASE | ||
| Bias | High frequency pulse power supply | ||
| Number of target sources | 4,Magnetron sputtering 1 ~ 3, ion source 1 ~ 3 | ||
| Control system | Programmable controller + computer | ||
| Coating process temperature | 80 ~ 250 degrees | ||
| Typical coating | Sputtering tin titanium nitride, sputtering CrN chromium nitride, DLC diamond-like carbon, etc. single layer, composite, nano coating | ||